ITM Web Conf.
Volume 30, 201929th International Crimean Conference “Microwave & Telecommunication Technology” (CriMiCo’2019)
|Number of page(s)||6|
|Section||Vacuum and Microvacuum Microwave Devices (2)|
|Published online||27 November 2019|
The effect of gas pressure during ion-plasma deposition on the microstructure of M-coatings and the emission properties of molecular sputter-deposited oxide cathodes
JSC «RPC «Istok» named after Shokin», st. Vokzalnaya, 2A, Fryazino, Moscow Region, 141190, Russia
* Corresponding author: firstname.lastname@example.org
The results of the study of the effect of gas pressure and gas composition bу ion-plasma deposition of oxide coatings on the microstructure and the emission properties of molecular sputter-deposited oxide cathodes (MSDOC) are presented. Scanning electron microscopy (SEM) with an energy-dispersive spectrometer (EDS) and atomic force microscopy (AFM) has been used to investigate changes in the morphology, microstructure, and elemental composition of the films. It is shown that with decreasing pressure, the emission properties of films improve, the coating density and grain size increase, and the roughness decreases.
© The Authors, published by EDP Sciences, 2019
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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