ITM Web Conf.
Volume 30, 201929th International Crimean Conference “Microwave & Telecommunication Technology” (CriMiCo’2019)
|Number of page(s)||6|
|Section||Nanoelectronics and Nanotechnology (5b)|
|Published online||27 November 2019|
Surface topologies of thin aluminum films and absorbing properties of metal dielectric structures in the microwave range
V.I. Vernadsky Crimean Federal University, 295007, Simferopol, Russia
* Corresponding author: email@example.com
The paper presents experimental and theoretical results on the surface topography of thin aluminum films. The ambiguous topology dynamics of the thin-film structure is represented as a function of the increase in the bulk mass of the deposited material, which leads to an occasional rise in roughness reaching its maximum at a film thickness of 7 nm. At same time on the same thickness of the conductive layer the maximum of the absorption coefficient variability is observed. A theoretical analysis of the optical coefficients depending on the size of the conductive film substantiated the existence of extremes, but at smaller thicknesses.
© The Authors, published by EDP Sciences, 2019
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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